Emerging Research Materials and Assembly Methods: Challenges and Opportunities
By
Dr. Daniel Herr
Director, Nanomanufacturing Sciences Research
Semiconductor Research Corporation
and
Co-Chair, Emerging Research Materials International Technology Working Group
International Technology Roadmap for Semiconductors
When: Tuesday, June 2, 2009
Time: 2:00pm - 3:00pm
Location: A265 Bourns Hall
Abstract:
Today's perception that manufacturing costs and percent device variability will increase exponentially with scaling and functional diversification is pervasive. Projected requirements, such as line edge roughness, long range dimensional and positional control, resolution, throughput, dopant variability, pattern matching, and functional density, increasingly challenge our ability to achieve reliable system performance. Extensible fabrication options are needed that enable: Sustainable, centered, low-variability fabrication technologies; new cost curves for nanoelectronics fabrication; and enhanced system value through integrated functional diversification. An optimal manufacturing strategy will reflect the convergence between application and design specific requirements and a synergistic set of material and assembly options. This talk will consider emerging research material and nano-fabrication opportunities that exhibit potential for satisfying projected International Technology Roadmap for Semiconductor (ITRS) requirements and enable extensible nanofabrication. It will include an update on the need for and status of ITRS Emerging Research Materials, such as smart resists, self assembling systems, and environmentally benign, high performance materials and processes. This talk also will explore emerging opportunities in functional diversification, which exhibits potential for enabling enhanced functional density on a CMOS platform, and provide a brief overview of Semiconductor Research Corporation.
About the Speaker:
Dr. Herr is Semiconductor Research Corporation's Director of Nanomanufacturing Sciences research. He leads an international team that provides vision, guidance, and leveraged support for a number of the world class collaborative interdisciplinary university research programs on emerging nanoelectronics related materials and assembly methods, environmentally benign high performance manufacturing, and enabling nano-characterization technology options. He also is exploring emerging research opportunities in bioelectronics, ultra low power systems, and energy harvesting. He held senior engineering positions at Honeywell Corporation, during the VHSIC program, and Shipley Company, in Japan, where he helped bring an R&D facility on-line. He also founded Avatar R&D Corporation, a materials, process, and product design consulting firm. Dr. Herr serves as Adjunct Associate Professor in the Department of Materials Science and Engineering at North Carolina State University, where he co-develops and co-teaches an interdisciplinary graduate level course on The Materials Science of Nanoelectronics. Dr. Herr provides ongoing technical leadership for the Semiconductor Industry Association's Lithography, Metrology, and ESH International Technology Working Groups. He co-founded and co-chairs the International Technology Roadmap for Semiconductors [ITRS] International Technology Working Group on Emerging Research Materials and co-chairs several international conferences and workshops. He also serves as Senior Editor for IEEE Transactions in Nanotechnology, Associate Editor for the Journal of Nanoparticle Research, and Reviewer for JVST A. Dr. Herr's technical accomplishments include a suite of optimization software, more robust than Taguchi's methodology, twelve foundational patents and fourteen pending patent applications, in areas such as: Defect tolerant patterning, controlled nanotube synthesis and placement, deterministic semiconductor doping, and ultimate CMOS devices. He is a Fellow of the International Society for Optical Engineering for specific achievements in the design, development, and commercialization of two early families of chemically amplified resists and for addressing critical patterning and control challenges in the deep nano-domain. His 45+ publications cover topics from mechanistic chemistry to strategic industry trends in nanoelectronics. He has given over 100 invited presentations and seminars, globally.